Papers


Low energy electron microscopy

  1. Principles of dual-beam low energy electron microscopy, M. Mankos, V. Spasov and E. Munro, Adv. Imag. Elec. Phys.  vol. 161, p. 1-53 (2010)

  2. Electron optics for high throughput low energy electron microscopy, M. Mankos, D. Adler, L. Veneklasen and E. Munro, Surf. Sci. vol. 601, p. 4733-4741 (2007)

  3. Electron optics for low energy electron microscopy, M. Mankos, D. Adler, L.H. Veneklasen and E. Munro, Physics Procedia 1, p. 485-504, (2008)

  4. Electron-electron interactions in cathode objective lenses, M. Mankos and D. Adler, Ultramic. vol. 93, p. 347-54, (2002)

  5. Thermal adatoms on Si(001), R.M. Tromp and M. Mankos, Phys. Rev. Lett. vol. 81, p. 1050-1053 (1998).

  6. Atomic step distributions on annealed periodic Si(001) gratings, S. Tanaka, C. C. Umbach, J. Blakely, R.M. Tromp and M. Mankos, J. Vac. Sci. Technol. A vol. 15, p. 1345-1350 (1997)

  7. Imaging hot-electron emission from metal-oxide-semiconductor structures, M. Mankos, R. M. Tromp, M. C. Reuter and E. Cartier, Phys. Rev. Lett. vol. 76, p. 3200-3203 (1996)

  8. Fabrication of arrays of large step-free regions on Si (001), S. Tanaka, C. C. Umbach, J. Blakely, R. M. Tromp and M. Mankos, Appl. Phys. Lett. vol. 69, p. 1235-1237 (1996)

  9. Close packed prism arrays for electron microscopy, V. Kolarik, M. Mankos and L. H. Veneklasen, Optik vol. 87, p.1-12 (1991)

  10. Electron-optical properties of multiple magnetic prism systems, M. Mankos, V. Kolarik and L. H. Veneklasen,  Nucl. Inst. Meth. Phys. Res. A298 (1990), 189


Electron lithography

  1. Basic constraints for a multibeam lithography column, M. Mankos, S. T. Coyle, A. Fernandez, A. Sagle, W. Owens, J. Sullivan, and T. H. P. Chang, J. Vac. Sci. Technol. B Volume 19, Issue 2, pp. 467-475 (March 2001)

  2. Electron–electron interactions in multibeam lithography columns, M. Mankos, A. Sagle, S. T. Coyle, and A. Fernandez, J. Vac. Sci. Technol. B vol. 19, p. 2566-2571 (2001)

  3. Multiple electron-beam lithography, T. H. P. Chang, Marian Mankos, Kim Y. Lee and Larry P. Muray, Microelectronic Engineering vol. 57-58, p. 117-135, (2001)

  4. Progress toward a high-brightness photoemission source for multiple-electron beam lithography, S. T. Coyle, A. Fernandez, G. Janaway, A. Sagle, and M. Mankos, J. Vac. Sci. Technol. B vol. 19, p. 2581-2584 (2001)

  5. Multisource optimization of a column for electron lithography, M. Mankos, S. T. Coyle, A. Fernandez, A. Sagle, P. Allen, W. Owens, J. Sullivan, and T. H. P. Chang, J. Vac. Sci. Technol. B vol 18, p. 3010-3016 (2000)

  6. Optimization of microcolumn electron optics for high-current applications, M. Mankos, K. Y. Lee, L. Muray, J. Spallas, Y. Hsu, C.B. Stebler, W. DeVore, E. Bullock, and T. H. P. Chang, J. Vac. Sci. Technol. B vol. 18, p. 3057-3060 (2000)

  7. Advances in arrayed microcolumn lithography, L. Muray, J. Spallas, C.B. Stebler, K. Y. Lee,  M. Mankos, Y. Hsu, M. Gmur, and T. H. P. Chang, J. Vac. Sci. Technol. B vol 18, p. 3099-3104 (2000)

  8. Experimental evaluation of arrayed microcolumn lithography, L.P. Muray, K.Y. Lee, J.P. Spallas, M.Mankos, Y. Hsu, M.R. Gmur, H.S. Gross, C.B. Stebler and T.H.P. Chang, Microelectronic Engineering vol. 53, p. 271-277, (2000)

  9. Demonstration of multiblanker electron-beam technology, G. Winograd, V. Krishnamurthi, R. Garcia, L. H. Veneklasen, M. Mankos, and F. Pease, J. Vac. Sci. Technol. B vol 18, p. 3099-3104 (2000)

  10. Thin-film gated photocathodes for electron-beam lithography, Z. Pei, J. McCarthy, and C.N. Berglund, T. H. P. Chang, M. Mankos, K. Y. Lee, and M. L. Yu, J. Vac. Sci. Technol. B vol. 17, p. 2814-2818 (1999)

  11. Electron-optical optimization for Gaussian, high-current, high-dose columns, M. Mankos, L. H. Veneklasen, R. Garcia, and H. Pearce-Percy, J. Vac. Sci. Technol. B vol. 16, p. 3206-3210 (1998)

  12. Optimization of field-emission columns for next-generation MEBES® systems, H. T. Pearce-Percy, F. E. Abboud, R. Garcia, and M. Mankos, J. Vac. Sci. Technol. B vol. 15, p. 2754-2759 (1997)

  13. Advanced electron-beam pattern generation technology for 180-nm masks, F. E. Abboud, C. A. Sauer, W. Wang, M. Vernon, R. Prior, H. T. Pearce-Percy, D. M. Cole, and M. Mankos, Proc. SPIE, Vol. 3236, 19 (1997)


Electron holography

  1. Electron holography and Lorentz microscopy of magnetic materials, M. Mankos, M. R. Scheinfein and J. M. Cowley, Adv. Imag. Elec. Phys. vol. 98, p. 323-426 (1996)

  2. Greatly-defocused, point-projection, off-axis electron holography, J. M. Cowley, M. Mankos and M. R. Scheinfein, Ultramic. vol. 63, p. 133-147 (1996)

  3. Quantitative magnetometry using electron holography: field profiles near magnetic force microscope tips, D.G. Streblechenko, M. R. Scheinfein, M. Mankos and K. Babcock, IEEE MAG vol. 32, p. 4124-4129 (1996)

  4. Comment on ‘Flux quantization in magnetic nanowires imaged by electron holography’, M. R. Scheinfein, D. M. Streblechenko and M. Mankos, Phys. Rev. Lett., vol. 77, p. 976 (1996)

  5. Absolute magnetometry using electron holography : Magnetic superlattices and small particles, M. Mankos, M. R. Scheinfein and J. M. Cowley, MRS Bull. vol. 20, p. 45 (1995)

  6. Quantitative micromagnetics : Electron holography of magnetic thin films and multilayers, M. Mankos, M. R. Scheinfein and J. M. Cowley, IEEE Trans. MAG (1996)

  7. Nanomagnetometry : Electron holography of small particles, M. Mankos, M. R. Scheinfein and J. M. Cowley, IEEE Trans. MAG (1995)

  8. Quantitative micromagnetics at high spatial resolution using electron holography, M. Mankos, M. hR. Scheinfein and J. M. Cowley, Phys. Stat. Sol. vol. 154, p. 469-504 (1996)

  9. STEM Holography of Magnetic Materials, M. Mankos, P. deHaan, V. Kambersky, G. Matteucci, M. R. McCartney, Z. J. Yang,  M. R. Scheinfein and J. M. Cowley, in Electron Holography, Delta Series, eds. A. Tonomura, L. Allard, G. Pozzi, D. Joy and Y. Ono, Elsevier Sciences, p. 329 (1995)

  10. Absolute Magnetometry of Thin Cobalt Films and Co/Cu Multilayer Structures at Nanometer Spatial Resolution, M. Mankos, Z. J. Yang, M. R. Scheinfein and J. M. Cowley, IEEE Trans. MAG 30, p. 4497 (1994)

  11. Far Out-of-Focus Electron Holography in a Dedicated FEG STEM, M. Mankos, M. R. Scheinfein and J. M. Cowley, Ultramic. 58, p. 87(1995)

  12. Absolute Magnetometry at Nanometer Spatial Pesolution : STEM Holography of Thin Cobalt Films, M. Mankos, M. R. Scheinfein and J. M. Cowley, J. Appl. Phys. 75, p. 7418 (1994)

  13. Scanning Transmission Electron Microscopy of Thin Magnetic Films, M. Mankos, M. R. Scheinfein, R. V. Chamberlin, M. B. Stearns and J. M. Cowley, IEEE Trans. MAG 30, p. 720 (1994)


Summary

Team

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