Patents


Electron Lithography

  1. • High-fidelity reflection electron beam lithography, M. Mankos, # 7,692,167;  April 6, 2010

  2. • Maskless reflection electron beam projection lithography, M. Mankos, H.F. Hess, D.L. Adler, and K.J. Bertsche,  # 6,870,172;  March 22, 2005

  3. • Systems, control subsystems, and methods for projecting an electron beam onto a specimen, M. Zywno, M. Mankos, H.F. Hess, and S. Levi, # 7,342,238; March 11, 2008

  4. • Electron beam lithography system having improved electron gun, A. Fernandez, M. Mankos, J.S. Sullivan, and P.C. Allen, # 7,095,037; August 22, 2006

  5. • Diamond supported photocathodes for electron sources, A. Fernandez, T. Thomas, X. Chen, S.T. Coyle, M. Yu, and M. Mankos, # 6,759,800, July 6, 2004

  6. • Multiple electron beam lithography system with multiple beam modulated laser illumination, M. Mankos, S.T. Coyle, A. Fernandez, A.L. Sagle, P.C. Allen, X. Chen, D. Holmgren, W. Owens, J.S. Sullivan, T. Thomas, M.A. Gesley, # 6,724,002; April 20, 2004

  7. • Suppression of emission noise for microcolumn applications in electron beam inspection, M. Mankos, T.H.P. Chang, K.Y. Lee, and M. Yu, # 6,555,830; April 29, 2003

  8. • Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance, M. Mankos, V. Krishnamurthi, and K.Y. Lee, # 6,538,256; March 5, 2003

  9. • Moving photocathode with continuous regeneration for image conversion in electron beam lithography, L.H. Veneklasen, M. Mankos, and B.S. van Mast, # 6,476,401; November 5, 2002

  10. • Multiple beam electron beam lithography system, M. Mankos, S.T. Coyle, A. Fernandez, and T.H.P. Chang, # 6,429,443; August 6, 2002

  11. • Optical coupling to gated photocathodes, J.S. Sullivan, S.T. Coyle, A. Fernandez,  and M. Mankos, # 6,399,934; June 4, 2002

  12. • Gated photocathode for controlled single and multiple electron beam emission, K.Y. Lee, T.H.P. Chang, M. Mankos, S.T. Coyle, and C.N. Berglund, # 6,376,985; April 23, 2002

  13. • Patterned heat conducting photocathode for electron beam source, A. Fernandez, M. Mankos, T.H.P. Chang, K.Y. Lee, and S.T. Coyle, # 6,376,984; April 23, 2002

  14. • Electrostatic alignment of a charged particle beam, T.H.P. Chang, M. Mankos, L.P. Muray, H.S. Kim, and K.Y. Lee, # 6,288,401; September 11, 2001

  15. • Method of forming gated photocathode for controlled single and multiple electron beam emission, K.Y. Lee, T.H.P. Chang, M. Mankos and C.N. Berglund, # 6,220,914; April 24, 2001

  16. • Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography, M. Mankos and L.H. Veneklasen, # 6,215,128; April 10, 2001

  17. • Charged particle beam illumination of blanking aperture array, M. Mankos, # 6,157,039; December 5, 2000

  18. • Shaped shadow projection for an electron beam column, L.H. Veneklasen, T.H.P. Chang and M. Mankos, # 6,011,269; January 4, 2000



Low energy electron microscopy

  1. • High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus, D. Walker, S. Harb, V. Spasov, D. Stites, I. Lewis, and M. Mankos, # 7,566,873;  July 28, 2009

  2. • Electrical process monitoring using mirror-mode electron microscopy, P. F. Marella, M.A. McCord, M. Mankos and D. Adler, # 7,514,681; April 7, 2009

  3. • Holey mirror arrangement for dual-energy e-beam inspector, M. Mankos and E. Munro, # 7,217,924; May 15, 2007

  4. • Scanning electron microscope with curved axes, M. Mankos and K. Weiner, # 7,205,542; April 17, 2007

  5. • Apparatus and method for tilted particle-beam illumination, M. Mankos, L. Grella and D.L. Adler, # 7,009,177; March 7, 2006

  6. • Twisted-compensated low-energy electron microscope, M. Mankos, # 6,943,360; September 13, 2005

  7. • Dual-energy electron flooding for neutralization of charged substrate, M. Mankos and D.J. Parker, # 6,930,309; August 16, 2005

  8. • Method and apparatus for reducing substrate edge effects in electron lenses, M. Mankos and D.L. Adler, # 6,903,338; June 7, 2005

  9. • Prism array for electron beam inspection and defect review, M. Mankos, # 6,878,937; April 12, 2005

  10. • Immersion objective lens for e-beam inspection, M. Mankos and D.L. Adler, # 6,858,843; February 22, 2005

  11. • Photocathode source for e-beam inspection or review, M. Mankos and D.L. Adler, # 6,812,461; November 2, 2004

  12. • Method and apparatus for dual-energy e-beam inspector, M. Mankos and D.L. Adler, # 6,803,571; October 12, 2004

  13. • High contrast inspection and review of magnetic media and heads, M.Mankos, D.A. Soltz, and H.F. Hess, # 6,759,654 and 6,936,816; July 6, 2004 and August 30, 2005


Summary

Team

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